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Thickness dependence of Structural and Magnetic properties of Ni/Al/Ni films

Author Affiliations

  • 1 Department of Physics, Gulbarga University, Gulbarga 585106, Karnataka, INDIA

Res. J. Physical Sci., Volume 3, Issue (10), Pages 4-8, December,4 (2015)


Sandwiched films, Ni(100nm)/Al(t)/Ni(100nm) with t = 60nm, 70nm, 80nm, 90nm and 100nm were deposited at 473K by thermal and electron beam evaporation techniques in high vacuum. Scanning electron microscopy (SEM) and Atomic force microscope (AFM) were employed to study surface structure and grain sizes. Grain sizes are found to be increasing with increasing interfacer layer. Magnetization has been measured in a vibrating sample magnetometer (VSM). Coercive field, saturation magnetization, remanent magnetization were determined. The results revealed the existence of antiferromagnetic (AF) coupling between Ni layers through an interfacer Al layer. The strength of AF coupling was observed to be dependent on Al layer thickness. For the first time that Ni/Al/Ni films of varied Al thickness have been studied for structure and magnetic properties and the data has been thoroughly analyzed.


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