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Structural, Optical and Electrical Characteristics of Nanostructured ZnO thin Films with various Thicknesses deposited by RF Magnetron Sputtering

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Author Affiliations

  • 1Department of Physics, Osmania University, Hyderabad, INDIA
  • 2 Department of Physics, Mahatma Gandhi University, Nalgonda AP, INDIA

Res. J. Physical Sci., Volume 1, Issue (6), Pages 17-23, July,4 (2013)

Abstract

Zinc oxide thin films having various thicknesses between 100 nm and 400 nm were deposited on glass substrates by RF magnetron sputtering technique. These films have been analyzed for their structural, optical and electrical properties as a function of the thickness by a series of characterization techniques, including X-ray diffraction (XRD), scanning electron microscopy (SEM), energy dispersive spectroscopy (EDS), resistivity measurements and spectrophotometer. The micro structural parameters, such as the lattice constant, crystallite size, stress and strain are calculated. All these films exhibited strong (002) diffraction peaks corresponding to hexagonal wurtzite structure. The visible range transmittance was found to be over 90%. The optical band gap increased from 3.21 eV to 3.37 eV and the electrical resistivity decreased from 5.21x10-2 Ω cm to 1.47x10-2 Ω cm with increase of film thickness.

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